Who We Are

Founded in 2007, Lotus Applied Technology was formed through a spinoff from Planar Systems, a pioneer in Atomic Layer Deposition technology and manufacturing.  Housed in a fully dedicated 20,000 square foot R&D laboratory and clean room facility, our team of technologists has been working together for decades.  Our ALD equipment set includes:

  • Four P400A Conventional Pulse-Based ALD reactors
  • Roll to Roll ALD research scale PEALD reactor
  • TransFlex Roll to Roll Pilot scale PEALD reactor
  • Two Vortex Rotary Batch PEALD reactors

What We Do

At LotusAT, we invent and develop radical new ways to achieve the unique attributes of ALD at speeds and costs normally associated with commercial evaporation and sputtering, and license these technology platforms to equipment manufacturers and end users.

With key patents granted and additional patents pending, along with many years of accumulated know how and trade secrets, we provide a broad base of protected intellectual property in Spatial ALD equipment design, materials, and processes.  And our patent reach extends world-wide, with granted and pending patents in the US, Europe, China, Korea, and Japan.