Our unique patented technology for Roll to Roll PEALD achieves high speed, low cost deposition in a remarkably simple way. We weave the flexible substrate back and forth between physically separated precursor regions, as illustrated in this animation:
This geometry allows extended path lengths for the substrate in each of the reaction zones, allowing web speeds orders of magnitude faster than can be achieved in Spatial ALD reactors utilizing coating “heads”.
Operating under medium vacuum pressure similar to that used for conventional ALD, precursor separation is easily maintained by differential pressure and pumping, allowing large open passageways, millimeters wide, for the substrate to pass through. This is in stark contrast to atmospheric pressure Spatial ALD, where the passageway gaps must be restricted to 10’s of microns to avoid precursor mixing. And the use of a simple DC direct plasma instead of water as the oxygen precursor allows us to maintain very high web speeds, even at very low temperatures.
TransFlex ALD technology offers:
- Continuous Roll to Roll processing at speeds up to 10 meters per second.
- Simplified processing and maintenance. Only the web surface is coated, as it is the only surface that “sees” both reactants.
- High precursor utilization.
- Film properties consistent with conventional ALD coatings.