Lotus’ Vortex batch ALD technology is ideally suited to displace conventional ALD in semiconductor processing.  But because of its high speed deposition and low materials costs, it is also poised to extend ALD to a broad set of applications historically served by CVD, sputtering, and evaporation processes, including:

  • Hermetic encapsulation and protection for rigid substrates and devices
    • Direct encapsulation of OLED displays and lighting
    • Direct encapsulation of CIGS and OPV panels
    • Implantable medical devices
    • Chemical corrosion protection
  • Optical Coatings
    • Antireflection coatings
    • Beam splitters
    • Dichroics
  • MEMS
  • Sensors
  • Thin film batteries
  • Disc and thin film heads