Technology

Today, we’re not just making ALD faster, we’re changing the fundamental way it’s deposited, unlocking new applications where cost and throughput are critical.  For more than 10 years, we have pushed the state of the art in high speed batch and roll to roll ALD, continuously improving throughput and driving down deposition costs, with a track record of firsts in the technology:

2008 First ALD film deposition on polymers using spatial ALD
2009 First true Roll to Roll PEALD
2011 Roll to Roll ultra-barriers at less than 6nm thickness
2014 Vortex batch ALD at speeds in excess of 5 Å/second
2015 Roll to Roll ultra-barriers with thickness <7nm, at 475 m/min 
2016 Precursor utilization in excess of 90%
2017 Ideal conformality in trenches with aspect ratios up to 50:1
2018 High quality ALD coatings on damp substrates – no need to dry!

Our intellectual property portfolio includes fundamental granted patents in equipment architecture, materials, and deposition methods for roll to roll and batch systems, with more applications pending.  Our patent reach extends worldwide, with granted and pending patents in the US, Europe, Korea, China, and Japan.