Publications

We routinely present our technology development results through publications and presentations at technical conferences, including the Society of Vacuum Coaters and the American Vacuum Society.  A selection of our publications and presentations:

  • “High Rate Roll to Roll ALD, and its Application to Moisture Barriers on Polymer Films”, Journal of Vacuum Science and Technology A, Volume 30, issue 2, March, 2012
  • Spatial Atomic Layer Deposition: A Route Towards Further Industrialization of Atomic Layer Deposition, Journal of Vacuum Science and Technology A, Volume 30, issue 1, 2012
  • “Roll to Roll PEALD of Mixed Oxide Films for High Barrier Applications”, 2013 American Vacuum Society International Symposium and Exhibition, October, 2013
  • “High Speed Rotary Spatial ALD for Commercial Applications”, 57th Annual Technical Conference of the Society of Vacuum Coaters, May, 2014
  • “Optical Coatings by High Speed Rotary Spatial ALD”, 58th Annual Technical Conference of the Society of Vacuum Coaters, April 30, 2015
  • Optimizing the ALD Cycle for High Speed, Low Cost Barrier Films in Commercial Packaging Applications”, AIMCAL Web Coating & Handling Conference, October 25-28, 2015
  • Optimization of Precursor Utilization Using Spatial ALD”, 59th Annual Technical Conference of the Society of Vacuum Coaters, May, 2016
  • Interaction Between DC Plasma and Substrates in Spatial ALD”, 60th Annual Technical Conference of the Society of Vacuum Coaters, May, 2017
  • “Conformality of SiO2 and Al2O3 Coatings Produced using High Speed Spatial PEALD with a DC Plasma”, ALD 2018 – the 18th International Conference on Atomic Layer Deposition, July 29 – August 1, 2018, Incheon, Korea

Coming Soon…..

  • “Spatial PEALD on Moisture-Containing Substrates and in High Moisture Backgrounds”, 62nd Annual Technical Conference of the Society of Vacuum Coaters, May, 2019, Long Beach, CA
  • Low Temperature Spatial PEALD of Silicon Nitride Films from Aminosilane Precursors and DC Direct Plasma, ALD 2019 – the 19th International Conference on Atomic Layer Deposition, July 21- 24, 2019, Seattle, WA