Leaders in Spatial ALD
Fast, Affordable, Unmatched
Experience speed, affordability, and precision that will elevate your success. With high-quality coatings produced up to 1000x faster than traditional ALD, you’ll stay ahead in an industry where slow isn’t an option.
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What We Do
Conventional ALD is an extremely precise manufacturing technique, but it can be complicated and costly. Over the course of more than 15 years designing and implementing spatial ALD, Lotus AT has developed a broad set of proprietary techniques for cost-effective application of ALD technology.
experience
Leading semiconductor and technology companies for over 3 decades, we future-proof high-speed coating solutions for a wide range of materials, substrates, and applications.
Reliability
Stay ahead and stand out with seamless technology integration, continuous innovation, and in-depth market feasibility assessments. Partnering with Lotus AT means minimizing risks and maximizing ROI.
View Our Technology
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
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Up to
Faster
Years Experience
Spacial ALD Experience
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.