Technology
In-Line Roll to Roll Platform
As with our sheet-to-sheet platform, we leverage the many advantages of our PlasmaShieldTM technology to facilitate a flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Minimal Web Manipulation
This platform provides a straight in-line path for ALD processing, greatly simplifying web handling, and facilitating processing of very wide, thin substrate material.
Higher Speed than Competing Technologies
While not as fast as our TransFlexTM Roll to Roll technology, this platform offers significantly higher speed and film quality compared to competing ALD systems, while offering the flexibility of varied coating thickness without system reconfiguration.
Simple Precursor Isolation
The PlasmaShieldTM sources are autonomously isolated, preventing CVD interaction event with multi-millimeter spacing between the plasma array and the substrate, while the precursor vapor occupies the rest of the reaction space.
Superior Ultra-Barriers
When coupled with our patented mixed oxide barrier materials, environmentally robust ultra-barrier coatings may be applied at web speeds up to 5-10 meters per minute.
Elegantly simple platform with great flexibility and good speed
Readily scales to thin substrates with multi-meter roll widths
Compact processing chamber with minimal substrate manipulation
Highly versatile roll to roll ALD platform.
Our in-line R2R platform enables PEALD on delicate and wide area rolls of substrate material, using an oscillating PlasmaShieldTM head above the rolling substrate material. Flexibility in web handling and increased mechanical tolerances are greatly improved compared to competing R2R ALD systems.
%20(1).jpg)
Want to work with us?
If you're looking to learn how ALD could work in your application, we'd love to talk.
