In-Line Roll-to-Roll Platform
High-speed technologies, superior ultra-barriers
As with our sheet-to-sheet platform, we leverage the many advantages of our PlasmaShield™ technology to facilitate a flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Minimal Web Manipulation
This platform provides a straight in-line path for ALD processing, greatly simplifying web handling, and facilitating processing of very wide, thin substrate material.
Higher Speed than Competing Technologies
While not as fast as our TransFlexTM Roll to Roll technology, this platform offers significantly higher speed and film quality compared to competing ALD systems, while offering the flexibility of varied coating thickness without system reconfiguration.
Simple Precursor Isolation
The PlasmaShieldTM sources are autonomously isolated, preventing CVD interaction event with multi-millimeter spacing between the plasma array and the substrate, while the precursor vapor occupies the rest of the reaction space.
Superior Ultra-Barriers
When coupled with our patented mixed oxide barrier materials, environmentally robust ultra-barrier coatings may be applied at web speeds up to 5-10 meters per minute.
Leverage the advantages of simplified design.
Elegantly simple platform with great flexibility and good speed
Readily scales to thin substrates with multi-meter roll widths
Compact processing chamber with minimal substrate manipulation
Highly versatile roll to roll ALD platform.
Our in-line R2R platform enables PEALD on delicate and wide area rolls of substrate material, using an oscillating PlasmaShield™ head above the rolling substrate material. Flexibility in web handling and increased mechanical tolerances are greatly improved compared to competing R2R ALD systems.
View Our Technology
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
