Rapid Thermal ALD
Optimized temperature, fast deposition speed.
Our Rapid Thermal ALD technology uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product, using a high intensity linear lamp for batch processing, or a laser for patterned film deposition.
Optimized Temperature for Each Half-Reaction
Precursor chemisorption may occur at low temperature, while the reaction for conversion can occur at much higher temperature, as the two steps are spatially isolated.
RTP at the ALD Cycle Frequency
Just as with conventional bulk RTP technologies used in the semiconductor and display industries, high temperature annealing affects can be attained at lower substrate temperature, but here we anneal the film one molecular layer at a time, for extremely short times.
Enabler for Patterned Deposition
For patterned deposition, we use a laser to “write” the pattern, so that only the pattern is converted to the coating, with resolution limited only by the laser beam width.
High Deposition Speed
Thermal Batch ALD can be performed at several cycles per second, while laser patterned RT-ALD can be written at meters per second.
Ultra-rapid thermal exposure, with low substrate temperatures.
High temperature quality thermal ALD at low substrate temperature
Incomparable throughput for batch and patterned thermal ALD
Direct deposition of patterned coatings with high resolution (using the laser)
High performance ALD at low substrate temperature.
This technology allows the use of thermally unstable precursors to be employed in high temperature processing, providing access to a broad and more flexible precursor set for high performance coatings, and allowing high temperature processing on thermally sensitive substrates.
Customizability with laser precision.
Rapid Thermal ALD allows for fine detail patterned coatings can be fabricated using the laser scanning technology.
View Our Technology
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
