Vortex™ ALD
Efficient, cost-effective, and high performing technology.
Vortex™ ALD is a rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
Higher Batch
Deposition Speeds
Several angstroms per second, which is faster than many oxide sputtering processes.
Low Particulate
Generation
No coating anywhere in the chamber except on the substrates and carrier surface.
Low
Materials Costs
Precursors are consumed only on the substrate track – exhausted precursor material may be captured and re-used.
Low Temperature Processing
Leveraging the advantages of simple DC plasma, our processes are available at 100°C or lower, even down to room temperature.
Vortex™ ALD can deliver five ALD cycles per second in its single cycle configuration
When paired with PlasmaShield technology it can yeild up to 20 cycles.
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Revolutionizing batch ALD processing.
Instead of pulsing and purging precursors from a static substrate in a single chamber, the substrate is transported by rotation to the various precursor and purge zones of the reactor. This eliminates the time required for precursor introduction, saturation, and purge with each ALD cycle. Further, Lotus AT’s patented Radical Enabled ALD process, incorporating Precursor “Separation” by Radical Deactivation technology, greatly simplifies zone separation in the reactor, and enables the use of a simple DC plasma for PEALD processing.
Easily Scalable
This technology can be scaled from small reactors for research or small area manufacturing, to meter-scale substrates.
View Our Technology
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
