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PlasmaShield™
Radical deactivation, simplified design.
Our PlasmaShield™ technology creates a highly localized plasma source with a closely coupled radical deactivation shroud surrounding the electrode, which allows the source to be suspended in a chamber surrounded by precursor while maintaining “separation”.
Highly Localized
The compact size of the source allows it to be deployed for multiple ALD cycles per pass when integrated into the Vortex, Sheet to Sheet, or In-Line Roll to Roll platforms.
Efficient Radical Deactivation
The geometry and materials employed in the PlasmaShieldTM source facilitate radical recombination in a surprisingly short path, allowing close spacing between sources in a “head” configuration.
Simplification of Head Design
Because only a one-way purge for each source is required, a common volume containing the precursor vapor may be utilized for all plasma sources in the system.
Multiple Sources with Single Power Supply
Our robust DC plasma technology enables the use of a single magnetron sputtering power supply to drive an array of up to 50 PlasmaShieldTM sources.
Closely-spaced ALD cycles with a highly localized plasma source.
ALD cycle multiplier for batch coating
Facilitates high speed roll to roll processing with a linear web configuration
Enables high speed low temperature large area sheet-to-sheet processing
Our compact plasma enables tighter ALD cycle spacing.
This means that we can increase the number of ALD cycles per revolution on our Vortex batch technology, or we can integrate these sources into a coating “head”, where each PlasmaShield source can be closely spaced apart, with the gaps between these sources providing the precursor exposure.
Versatile large format coating.
This coating "head" can then be employed in a linear Roll to Roll coating system, or in a sheet-to-sheet large area coating system.
View Our Technology
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
