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Redefine Your Possibilities
Spatial ALD, redefined with speed, affordability, expertise, and scalability—delivering precision and performance when it matters most.
Cutting-edge Capabilities
Achieve high-performance, versatile, and durable coatings on complex surfaces—backed by advanced barrier protection and proven support for seamless integration.
Up to 1000x Faster
High-precision coatings at breakthrough speeds, enabling mass production.
Proven ALD Expertise
30+ years of industry leadership, trusted by top semiconductor and electronics companies.
Cost-Effective & Scalable
Reduces manufacturing costs while ensuring reliable, high-performance coatings.
Versatile Material Compatibility
Works on flexible, 3D, and complex surfaces for diverse applications.
Advanced Barrier Protection
Pinhole-free coatings safeguard against moisture, chemicals, and degradation.
Comprehensive Support & Licensing
Flexible integration options with expert guidance and joint development agreements (JDAs).
Semiconductor Equipment Manufacturers
Increase throughput, raise yields and lower cost of ownership while being able to utilize unmatched process flexibility.
Industrial Equipment Manufactures
Scalable, cost-effective ALD solutions to improve product performance and reduce manufacturing costs while maintaining quality. Experience seamless integration of ALD into existing processes.
Startups & Emerging Technology Companies
Accelerate development while cutting R&D costs with expert ALD support. Stay ahead with industry-leading deposition technology, and fast-track innovation through joint development agreements (JDAs).
End Product Original Equipment Managers (OEMs)
Deliver ultra-thin, pinhole-free films with exceptional uniformity, even on complex surfaces, delivering high-performance ALD coatings at the cost of traditional PVD and CVD processes.
View Our Technology
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
