Lotus News: Lotus AT's Bryan Danforth Presenting at 2024 SVC Tech Con in Chicago, IL on Monday May 6, 2024

In this presentation we are excited to share research results about utilizing precursor co-flow delivery to tune the resulting film composition, and thereby tailor specific film properties. For this project, we simultaneously deliver an aluminum precursor (TMA) and silicon precursor (BDIPADS) in the same delivery stream to the reactor to yield a homogenous, ternary mixed oxide film, aluminum silicate (AlSiOx). Film composition is controlled by throttling TMA flow into the co-flow stream. We observed that AlSiOx is particularly resilient to harsh environmental treatment, such as heat and humidity. For instance, AlSiOx provides similar WVTR barrier perfomance, even after exposed to 1 hour of direct steam (100 deg C, 100 %RH). Finally, we discuss how scaling this process to either a spatial, batch, rotary system (rigid substrates) or a inline, linear, roll-to-roll system (flexible web substrates) enables low-cost, high-speed AlSiOx film coating.

Monday, May 6, 2024 at 5:10 pm.